别名: 碲化铋;碲化铋(III);1H-吡咯并[2,3-b]吡啶-2-醇;碲化铋(III), 99.98% (METALS BASIS);碲化铋(III), 真空沉积级, 99.999% (METALS BASIS);碲化铋(III),VACUUMDEPOSITIONGRADE,99.999%(METALSBASIS);碲化铋(III), VACUUM DEPOSITION GRADE, 99.999% (METALS BASI;P/N型碲化铋;碲化铋BI(III);N型(掺锡2-5%)BISMUTH TELLURIDE
分子式: Bi2Te3
分子量: 800.76
EINECS: 215-135-2